Evaluation of deep UV ANR photoresists for 248.4 nm. excimer laser photolithography.
نویسندگان
چکیده
منابع مشابه
Deep-UV Excimer Lasers
The recent trend in microelectronics towards patterning critical feature sizes of 0.25 m and below has motivated the development of microlithography at the deep ultra-violet (DUV) laser wavelengths of 248 and 1 93 nm. In recent years the performance, reliability, and cost of ownership of excimer light sources have improved. Some key technologies needed for excimer lasers in microlithography inc...
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PURPOSE: Ah the population of puticnts undergoing current rcfractivc procedures increases, il is now important for rliniciaos of all beckgmunds to know the various FDA and DHSS approved topical prcpantions which are roudnely used in the managemeot of tyes after Radial Kcretotomy (RK) sod IIxc:imer laser photorefractive kcratectomy (PRK). METIIODS: This paper prcsentn details of the various effe...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 1989
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.2.429